Utilization in semiconductor wafers and liquid crystal cleaning equipment.
For cleaning semiconductor wafers! Impurities are separated and removed at the molecular level by reverse osmosis membranes, achieving 90-99% removal!
The pure water production systems and equipment handled by Top Water Systems can also be used for cleaning purposes. They are suitable for precision cleaning, chemical product manufacturing, beverage raw materials, scientific experiments, surface cleaning before plating and painting, and the removal of odor-causing components. They are also utilized in cleaning devices for semiconductor wafers and LCDs. Starting with the "RO pure water system," which separates and removes impurities (organic substances, inorganic substances, bacteria, heavy metals, and chemicals) at a molecular level by 90-99% using RO (reverse osmosis membranes), we also offer "ultrasonic cleaning devices" and "fully automatic soft water systems." 【Related Products】 ■ RO Pure Water System ■ TW Series ■ Ion Exchange Cartridge Pure Water Purifier ■ Ultrasonic Cleaning Device *Our company provides comprehensive support from planning and also offers a rental trial service for demonstration units. *For more details, please refer to the PDF materials or feel free to contact us.
- Company：トップウォーターシステムズ
- Price：Other
